Integrated circuit mask technology
Material type: TextPublication details: New York McGraw-Hill 1985Edition: Description: xv, 287pISBN:- 621.3.049.77
Item type | Current library | Call number | Status | Date due | Barcode |
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Books | University Library | 621.3.049.77 ELL (Browse shelf(Opens below)) | Available | 00033239 |
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621.3.049.77 DUE Digital design | 621.3.049.77 DUR Current at the nanoscale: an introduction to nanoelectronics | 621.3.049.77 EIN Beam processing technologies | 621.3.049.77 ELL Integrated circuit mask technology | 621.3.049.77 ERN Global race in microelectronics: innovation and corporate strategies in a period of crisis | 621.3.049.77 FER Symbolic Analysis Techniques: Application to Analog Design Automation. | 621.3.049.77 FLE Engineering approach to digital design |
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