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Ion implantation : basics to device fabrication / by Emanuele Rimini.
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TextSeries: Kluwer international series in engineering and computer science ; SECS 293. | Kluwer international series in engineering and computer science. Electronic materials, science and technology.Publication details: Boston : Kluwer Academic Publishers, c1995.Description: xii, 393 p. : ill. ; 25 cmISBN: - 0792395204
- 621.3815/2 RIM
| Item type | Current library | Call number | Status | Date due | Barcode |
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Department of Physics | 621.3815/2 RIM (Browse shelf(Opens below)) | Available | PHY012836 |
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| 621.3815/2 PUL Pulsed laser deposition of thin films / | 621.3815/2 PUL Pulsed laser deposition of thin films : | 621.3815/2 RED Photoinduced defects in semiconductors / | 621.3815/2 RIM Ion implantation : | 621.3815/2 SCH Advanced MOS devices / | 621.3815/2 SCH Semiconductor material and device characterization / | 621.3815/2 SCH Delta-doping of semiconductors / |
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