Anu philip <br/><br/>
Preparation and characterization of high-k aluminium oxide thin films by atomic layer deposition for gate dielectric applications 
Anu Philip; guided by K. Rajeev Kumar 
 - Kochi  Department of Instrumentations; Cusat  2011 
 - 202p. 
<br/><br/><label>Subjects--Index Terms: </label>Dielectronics - high K-materials Atomic layer deposition of Aluminium oxide thin films MOS Capacitors 
<br/><br/><label>Universal Decimal Class. No.: </label>537.226:539.23  / ANU  T