000 | 00789cam a2200169 a 4500 | ||
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005 | 20220519104917.0 | ||
008 | 780428m19789999miua b 001 0 eng | ||
082 | 0 | 0 |
_a621.3 _bELE |
245 | 0 | 0 |
_aElectrotechnology, _b8v.; v. 5. Low-temperature plasma technology applications / Robert P. Ouellette, Marcel M. Barbier, Paul N. Cheremisinoff -- v. 6. High-temperature plasma technology applications / Lester A. Ettlinger ... [et al.] |
300 |
_av. <1-8 > : _bill ; _c24 cm. |
||
653 |
_aManufacturing processes _aElectrical engineering _aPower resources _aPlasma physics |
||
700 | 1 |
_aOuellette, Robert P., _98114 |
|
700 | 1 |
_aKing, John Allison, _98115 |
|
700 | 1 |
_aCheremisinoff, Paul N. _94056 |
|
942 | _cBK | ||
260 |
_aAnn Arbor, Mich. : _bAnn Arbor Science Publishers, _cc1978-<c1981 > |
||
999 |
_c266257 _d266257 |