Preparation and characterization of high-k aluminium oxide thin films by atomic layer deposition for gate dielectric applications Anu Philip; guided by K. Rajeev Kumar
Material type: TextPublication details: Kochi Department of Instrumentations; Cusat 2011 Description: 202pSubject(s):Item type | Current library | Call number | Status | Date due | Barcode |
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Theses | University Library Reference | 537.226:539.23 ANU T (Browse shelf(Opens below)) | Not for loan | T0000555 |
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