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Preparation and characterization of high-k aluminium oxide thin films by atomic layer deposition for gate dielectric applications Anu Philip; guided by K. Rajeev Kumar

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TextPublication details: Kochi Department of Instrumentations; Cusat 2011 Description: 202pSubject(s):

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Item type	Current library	Call number	Status	Date due	Barcode
Theses	University Library Reference	537.226:539.23 ANU T (Browse shelf(Opens below))	Not for loan		T0000555

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